Kinetic aspects of the interstitial-mediated boron diffusion in SiC

Materials Science Forum

Volumn 483-485, Issue , 2005, Pages 527-530

  Bockstedte, Michel ^a   Mattausch, Alexander ^a   Pankratov, Oleg ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Boron diffusion; Deep acceptor; Kick out mechanism

Indexed keywords

DIFFUSION; ION IMPLANTATION; REACTION KINETICS; SILICON CARBIDE;

BORON DIFFUSION; DEEP ACCEPTOR; KICK-OUT MECHANISM;

BORON;

EID: 35148850650     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-963-6.527     Document Type: Conference Paper

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