Line edge roughness impact on critical dimension variation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Ma, Yuansheng ^a   Levinson, Harry J ^a   Wallow, Thomas ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

CD variation; Correlation length; Fractal dimension; Line edge roughness (LER); Power spectral density (PSD)

Indexed keywords

CD VARIATION; CORRELATION LENGTH; CRITICAL DIMENSION (CD) UNIFORMITY; LINE EDGE ROUGHNESS (LER);

COMPUTER SIMULATION; FRACTAL DIMENSION; GATES (TRANSISTOR); POWER SPECTRAL DENSITY; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

WAFER BONDING;

EID: 35148841500     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712388     Document Type: Conference Paper

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