Simulation of critical dimension error using Monte Carlo method and its experimental verification

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2606-2609

  Zinn, Sonny Y ^a   Lee, Sung Woo ^a   Choi, Sung Woon ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; FOURIER OPTICS; MATHEMATICAL MODELS; MONTE CARLO METHODS; RANDOM NUMBER GENERATION;

CRITICAL DIMENSION ERROR; MASK ERROR ENHANCEMENT FACTOR; MASK UNIFORMITY; PHASE-SHIFT MASK;

PHOTOLITHOGRAPHY;

EID: 0036883126     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1524978     Document Type: Article

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