A kinematic analysis of disk motion in a double sided polisher for chemical mechanical planarization (CMP)

Tribology International

Volumn 41, Issue 2, 2008, Pages 111-118

  Kasai, Toshi ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

Chemical mechanical planarization (CMP); Double sided polisher; Trajectory analysis

Indexed keywords

KINEMATICS; LAPPING; SILICON;

CHEMICAL MECHANICAL PLANARIZATION (CMP); DOUBLE SIDED POLISHERS; TRAJECTORY ANALYSIS;

INDUSTRIAL APPLICATIONS;

EID: 34848881087     PISSN: 0301679X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.triboint.2007.05.003     Document Type: Article

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