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Volumn 218, Issue 3, 2004, Pages 253-267

Ultraprecision grinding technologies in silicon semiconductor processing

Author keywords

Grinding; Semiconductor; Silicon; Surface grinding; Ultraprecision

Indexed keywords

GRINDING (COMMINUTION); INTEGRATED CIRCUITS; MACHINE TOOLS; MICROPROCESSOR CHIPS; SEMICONDUCTOR MATERIALS; SILICON WAFERS;

EID: 26244435443     PISSN: 09544054     EISSN: 09544054     Source Type: Journal    
DOI: 10.1243/095440504322984812     Document Type: Conference Paper
Times cited : (27)

References (31)
  • 1
    • 0345068292 scopus 로고
    • VLSI, what does the future hold?
    • Moore, G. VLSI, what does the future hold? Electron. News, 1980, 42, 14-16.
    • (1980) Electron. News , vol.42 , pp. 14-16
    • Moore, G.1
  • 6
    • 0033893672 scopus 로고    scopus 로고
    • New developments in silicon Czochralski crystal growth and wafer technology
    • Mozer, A. P. New developments in silicon Czochralski crystal growth and wafer technology. Mater. Sci. Engng, 2000, B73, 36-41.
    • (2000) Mater. Sci. Engng , vol.B73 , pp. 36-41
    • Mozer, A.P.1
  • 8
    • 0346895276 scopus 로고    scopus 로고
    • Development of a ductile mode double disk grinding machine with trigonal prism type pentahedral structure for super-large and super-flat silicon wafer
    • Copenhagen, Denmark, 28-30 May
    • Abe, K. and Isobe, S. Development of a ductile mode double disk grinding machine with trigonal prism type pentahedral structure for super-large and super-flat silicon wafer. In Proceedings of the 1st EUSPEN Topical Conference on Fabrication and Metrology in Nanotechnology, Copenhagen, Denmark, 28-30 May 2000, Vol. 1, pp. 26-33.
    • (2000) Proceedings of the 1st EUSPEN Topical Conference on Fabrication and Metrology in Nanotechnology , vol.1 , pp. 26-33
    • Abe, K.1    Isobe, S.2
  • 9
    • 0036467624 scopus 로고    scopus 로고
    • A study on surface grinding of 300mm silicon wafers
    • Pei, Z. J. A study on surface grinding of 300mm silicon wafers. Int. J. Mach. Tools Mf., 2002, 42, 385-393.
    • (2002) Int. J. Mach. Tools Mf. , vol.42 , pp. 385-393
    • Pei, Z.J.1
  • 10
    • 0026239071 scopus 로고
    • A future technology for silicon wafer processing for VLSI
    • Abe, T. A future technology for silicon wafer processing for VLSI. Precision Engng, 1991, 13(4), 251-255.
    • (1991) Precision Engng , vol.13 , Issue.4 , pp. 251-255
    • Abe, T.1
  • 13
    • 0142148463 scopus 로고    scopus 로고
    • Simultaneous double-disk grinding-machining process for flat, low damage and material-saving silicon wafer substrate manufacturing
    • Turin, Italy, 27-31 May
    • Pietsch, G. J. and Kerstan, M. Simultaneous double-disk grinding-machining process for flat, low damage and material-saving silicon wafer substrate manufacturing. In Proceedings of the 2nd EUSPEN International Conference, Turin, Italy, 27-31 May 2001, pp. 644-647.
    • (2001) Proceedings of the 2nd EUSPEN International Conference , pp. 644-647
    • Pietsch, G.J.1    Kerstan, M.2
  • 15
    • 0002729008 scopus 로고
    • Vertical-spindle surface grinding
    • (Eds R. King and R. Hahn) (Chapman and Hall, London)
    • Youden, D. H. Vertical-spindle surface grinding. In The Handbook of Modern Grinding Technology (Eds R. King and R. Hahn), 1986 (Chapman and Hall, London).
    • (1986) The Handbook of Modern Grinding Technology
    • Youden, D.H.1
  • 16
    • 0037063907 scopus 로고    scopus 로고
    • Finite element analysis for grinding and lapping of wire-sawn silicon wafers
    • Liu, W. J., Pei, Z. J. and Xin, X. J. Finite element analysis for grinding and lapping of wire-sawn silicon wafers. J. Mater. Processing Technol., 2002, 129, 2-9.
    • (2002) J. Mater. Processing Technol. , vol.129 , pp. 2-9
    • Liu, W.J.1    Pei, Z.J.2    Xin, X.J.3
  • 17
    • 0035944453 scopus 로고    scopus 로고
    • A study of the total thickness variation in the grinding of ultraprecision substrates
    • Tso, P. and Teng, C. A study of the total thickness variation in the grinding of ultraprecision substrates. J. Mater. Processing Technol., 2001, 116, 182-188.
    • (2001) J. Mater. Processing Technol. , vol.116 , pp. 182-188
    • Tso, P.1    Teng, C.2
  • 18
    • 0037402259 scopus 로고    scopus 로고
    • Fine grinding of silicon wafers: A mathematical model for the chuck shape
    • Chidambaram, S., Pei, Z. J. and Kassir, S. Fine grinding of silicon wafers: a mathematical model for the chuck shape. Int. J. Mach. Tools Mf, 2003, 43, 739-746.
    • (2003) Int. J. Mach. Tools Mf , vol.43 , pp. 739-746
    • Chidambaram, S.1    Pei, Z.J.2    Kassir, S.3
  • 20
    • 0031361459 scopus 로고    scopus 로고
    • Technological advances in fine abrasive processes
    • Komanduri, R., Lucca, D. A. and Tani, Y. Technological advances in fine abrasive processes. Ann. CIRP, 1997, 46(2), 545-596.
    • (1997) Ann. CIRP , vol.46 , Issue.2 , pp. 545-596
    • Komanduri, R.1    Lucca, D.A.2    Tani, Y.3
  • 22
    • 0020881460 scopus 로고
    • Current status in, and future trends of, ultraprecision machining and ultrafine materials processing
    • Taniguchi, N. Current status in, and future trends of, ultraprecision machining and ultrafine materials processing. Ann. CIRP, 1983, 32(2), 573-582.
    • (1983) Ann. CIRP , vol.32 , Issue.2 , pp. 573-582
    • Taniguchi, N.1
  • 23
    • 0040427126 scopus 로고    scopus 로고
    • Nanogrinder for high precision machining of silicon wafers
    • Konnemann, G., Eichhorn, H. and Petzold, R. Nanogrinder for high precision machining of silicon wafers. Ind. Diamond Rev., 1999, 59(1), 30-33.
    • (1999) Ind. Diamond Rev. , vol.59 , Issue.1 , pp. 30-33
    • Konnemann, G.1    Eichhorn, H.2    Petzold, R.3
  • 24
    • 0029231067 scopus 로고
    • Analysis of mirror surface generation of hard and brittle materials by ELID (electrolytic in-process dressing) grinding with superfine grain metallic bond wheels
    • Ohmori, H. and Nakagawa, T. Analysis of mirror surface generation of hard and brittle materials by ELID (electrolytic in-process dressing) grinding with superfine grain metallic bond wheels. Ann. CIRP, 1995, 44(1), 287-290.
    • (1995) Ann. CIRP , vol.44 , Issue.1 , pp. 287-290
    • Ohmori, H.1    Nakagawa, T.2
  • 25
    • 0001327035 scopus 로고
    • Ultra-precision surface grinder having a glass-ceramic spindle of zero-thermal expansion
    • Namba, Y., Wada, R., Unno, K. and Tsuboi, A. Ultra-precision surface grinder having a glass-ceramic spindle of zero-thermal expansion. Ann. CIRP, 1989, 38(1), 331-334.
    • (1989) Ann. CIRP , vol.38 , Issue.1 , pp. 331-334
    • Namba, Y.1    Wada, R.2    Unno, K.3    Tsuboi, A.4
  • 26
    • 0026632143 scopus 로고
    • Tetraform grinding
    • Lindsey, K. Tetraform grinding. Proc. SPIE, 1991, 1573, 129-135.
    • (1991) Proc. SPIE , vol.1573 , pp. 129-135
    • Lindsey, K.1
  • 28
    • 0037063909 scopus 로고    scopus 로고
    • State of the art technologies and kinematical analysis for one-stop finishing of 0300mm Si wafer
    • Zhou, L. B., Eda, H. and Shimizu, J. State of the art technologies and kinematical analysis for one-stop finishing of 0300mm Si wafer. J. Mater. Processing Technol., 2002, 129, 39-40.
    • (2002) J. Mater. Processing Technol. , vol.129 , pp. 39-40
    • Zhou, L.B.1    Eda, H.2    Shimizu, J.3
  • 29
    • 0034956314 scopus 로고    scopus 로고
    • Development of single step grinding system for large scale 0300mm Si wafer; a total integrated fixed-abrasive solution
    • Eda, H., Zhou, L., Nakano, H., Kondo, R. and Shimizu, J. Development of single step grinding system for large scale 0300mm Si wafer; a total integrated fixed-abrasive solution. Ann. CIRP, 2001, 50(1), 225-228.
    • (2001) Ann. CIRP , vol.50 , Issue.1 , pp. 225-228
    • Eda, H.1    Zhou, L.2    Nakano, H.3    Kondo, R.4    Shimizu, J.5
  • 30
    • 26244441454 scopus 로고    scopus 로고
    • Development of a rotary fast tool servo for ultraprecision grinding of silicon wafer
    • Turin, Italy, 27-31 May
    • Goto, T., Asano, S., Hasegawa, O. and Tsuno, T. Development of a rotary fast tool servo for ultraprecision grinding of silicon wafer. In Proceedings of the 2nd EUSPEN International Conference, Turin, Italy, 27-31 May 2001, Vol. 1, pp. 790-795.
    • (2001) Proceedings of the 2nd EUSPEN International Conference , vol.1 , pp. 790-795
    • Goto, T.1    Asano, S.2    Hasegawa, O.3    Tsuno, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.