NH3-assisted growth approach for ZnO films by atmospheric pressure metal-organic chemical vapor deposition

Applied Physics A: Materials Science and Processing

Volumn 89, Issue 3, 2007, Pages 645-650

  Dai, Jiangnan ^a   Jiang, Fengyi ^a   Pu, Yong ^a   Wang, Li ^a   Fang, Wenqing ^a   Li, Fan ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; DEIONIZED WATER; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SURFACE MORPHOLOGY; ZINC OXIDE;

CRYSTALLINE STRUCTURE; EXCITON-PHONON SCATTERING; GROWTH AMBIENT; HALL MEASUREMENT;

THIN FILMS;

EID: 34748901239     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4248-6     Document Type: Article

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