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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6135-6139

Double-patterning technique using plasma treatment of photoresist

(6) Lee, Doo Youl a Kang, Yool a Chae, Yun Sook a Lee, Suk Joo a Cho, Han Ku a Moon, Joo Tae a

Author keywords

Double patterning technique; Extremely low k1; Pattern decomposition; Plasma treatment technique; Si thin film passivation

Indexed keywords

ETCHING; PASSIVATION; PLASMA APPLICATIONS; THIN FILMS;

DOUBLE PATTERNING TECHNIQUE (DPT); DOUBLE-PATTERNING TECHNIQUE; NUMERICAL APERTURE; OPTICAL PROXIMITY CORRECTION (OPC); PATTERN DECOMPOSITION; SI THIN-FILM PASSIVATION;

PHOTORESISTS;

EID: 34648819081 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.6135 Document Type: Article

Times cited : (7)

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