Novel hardening methods of DUV chemically amplified photoresist by ion implantation and its application to new organic ARC material and bilayer process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1364-1370

  Chun, Sung ^a   Kim, Hung Eil ^a   Barnett, Stan ^a   Shih, James ^a  

^a INTEGRATED DEVICE TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANTIREFLECTION COATINGS; ARGON; CARBON; DRY ETCHING; HARDENING; ION IMPLANTATION; RESINS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SHRINKAGE; THERMODYNAMIC STABILITY;

DEEP ULTRAVIOLET CHEMICALLY AMPLIFIED RESISTS; REFLECTIVE INDEX;

PHOTORESISTS;

EID: 0032647919     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350190     Document Type: Conference Paper

References (13)