Measurement and modeling of the emittance of silicon wafers with anisotropic roughness

International Journal of Thermophysics

Volumn 28, Issue 3, 2007, Pages 918-933

  Lee, H J ^a   Bryson, A C ^a   Zhang, Z M ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Anisotropic roughness; Emittance; Integrating sphere; Monte Carlo method; Reflectance

Indexed keywords

EMITTANCE; KIRCHHOFF'S LAW; RADIATIVE TRANSFER ANALYSIS; ZENITH ANGLES;

ANISOTROPY; CONTINUOUS WAVE LASERS; GAUSSIAN DISTRIBUTION; GEOMETRICAL OPTICS; MICROSTRUCTURE; MONOCHROMATORS; MONTE CARLO METHODS; MULTIPLE SCATTERING; REFLECTION; SEMICONDUCTOR LASERS; SURFACE ROUGHNESS; WAVELENGTH;

SILICON WAFERS;

EID: 34548695695     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10765-007-0192-0     Document Type: Article

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