Low thermal budget SiO2/Si3N4/SiO 2 stacks for advanced SONOS memories

Journal of Applied Physics

Volumn 102, Issue 5, 2007, Pages

  Saraf, Meirav ^a   Akhvlediani, Roza ^a   Edrei, Rachel ^a   Edelstein, Ruth Shima ^b   Roizin, Yakov ^b   Hoffman, Alon ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b TOWER SEMICONDUCTOR LTD   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE EFFECTS; OXIDATION; PLASMAS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR STORAGE; SILICON NITRIDE; SURFACE ROUGHNESS;

OXYGEN PLASMAS; SILICON OXYNITRIDES;

SILICA;

EID: 34548637109     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2772580     Document Type: Article

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