Copper electrodeposition in a magnetic field

Electrochimica Acta

Volumn 53, Issue 1, 2007, Pages 161-166

  Matsushima, Hisayoshi ^a   Bund, Andreas ^a   Plieth, Waldfried ^a   Kikuchi, Shiomi ^b   Fukunaka, Yasuhiro ^c  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF SHIGA PREFECTURE   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

Copper electrodeposition; Crystal orientation; Magnetic field; MHD; Surface morphology

Indexed keywords

CATHODES; CRYSTAL GROWTH; ELECTRODEPOSITION; MAGNETIC FIELD EFFECTS; SULFURIC ACID; VOLTAMMETRY;

ACTIVATION REGION; COLUMNAR DENDRITE; HYDROGEN EVOLUTION; MORPHOLOGICAL VARIATIONS;

COPPER;

EID: 34548575889     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.01.043     Document Type: Article

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