Composition dependence of work function in metal (Ni,Pt)-germanide gate electrodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 B, 2007, Pages 1865-1869

  Ikeno, Daisuke ^a   Kaneko, Yukihiro ^a,b   Kondo, Hiroki ^a   Sakashita, Mitsuo ^a   Sakai, Akira ^a   Ogawa, Masaki ^a   Zaima, Shigeaki ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

Capacitance voltage measurement; Crystalline phase; Electronegativity; Flat band voltage; Germanide; Metal gate; MOS; Ni Ge; Pt Ge; Work function

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRONEGATIVITY; ENERGY GAP; GERMANIUM COMPOUNDS; MOS DEVICES; PHASE COMPOSITION;

CAPACITANCE-VOLTAGE MEASUREMENT; CRYSTALLINE PHASE; FLAT-BAND VOLTAGE; METAL GATES; WORK FUNCTIONS;

GATE DIELECTRICS;

EID: 34547924169     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1865     Document Type: Article

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