Simulation of the electrical properties of SiH4/H2 RF discharges

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8172-8176

  Lyka, B ^a   Amanatides, E ^a   Mataras, D ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

Amorphous silicon; Fluid model; Microcrystalline silicon; PECVD

Indexed keywords

AMORPHOUS SILICON; ELECTRIC PROPERTIES; ELECTRODEPOSITION; ENERGY DISSIPATION; MICROCRYSTALLINE SILICON;

FLUID MODELS; IONIZATION RATES; RF DISCHARGES;

ELECTRIC DISCHARGES;

EID: 34547921677     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8172     Document Type: Article

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