SCOPUS 정보 검색 플랫폼

Volumn 46, Issue 17-19, 2007, Pages

Effects of thin film interference on junction activation during sub-millisecond annealing

Author keywords

Millisecond annealing; Silicon on insulator; Thin film interference; Ultra shallow junction

Indexed keywords

ANNEALING; LIGHT ABSORPTION; RECRYSTALLIZATION (METALLURGY); SILICON ON INSULATOR TECHNOLOGY;

MILLISECOND ANNEALING; THIN FILM INTERFERENCE; ULTRA SHALLOW JUNCTION;

THIN FILMS;

EID: 34547879267 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.L427 Document Type: Article

Times cited : (3)

References (13)

1
- 0033309643
- S. Talwar, G. Verma, and K. H. Weiner: Proc. Ion Implant. Technol., 1998, p. 1171.
- (1998) Proc. Ion Implant. Technol , pp. 1171
- Talwar, S.¹ Verma, G.² Weiner, K.H.³

2
- 0033315075
- B. Yu, Y. Wang, H. Wang, Q. Xiang, C. Riccobene, S. Talwar, and M. Lin: IEDM Tech. Dig., 1999, p. 509.
- (1999) IEDM Tech. Dig , pp. 509
- Yu, B.¹ Wang, Y.² Wang, H.³ Xiang, Q.⁴ Riccobene, C.⁵ Talwar, S.⁶ Lin, M.⁷

3
- 0005075383
- R. Murto, K. Jones, M. Rendon, and S. Talwar: Proc. Ion Implant. Technol., 2000, p. 182.
- (2000) Proc. Ion Implant. Technol , pp. 182
- Murto, R.¹ Jones, K.² Rendon, M.³ Talwar, S.⁴

4
- 34547861369
- T. Ito, T. Iinuma, A. Murakoshi, H. Akutsu, K. Suguro, T. Arikado, K. Okumura, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama, and T. Kusuda: Ext. Abstr. Solid State Devices and Materials, 2001, p. 182.
- T. Ito, T. Iinuma, A. Murakoshi, H. Akutsu, K. Suguro, T. Arikado, K. Okumura, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama, and T. Kusuda: Ext. Abstr. Solid State Devices and Materials, 2001, p. 182.

5
- 0036136178
- T. Gebel, M. Voelskow, W. Skorupa, G. Mannino, V. Privitera, F. Priolo, E. Napolitani, and A. Camera: Nucl. Instrum. Methods Phys. Res., Sect. B 186 (2002) 287.
- T. Gebel, M. Voelskow, W. Skorupa, G. Mannino, V. Privitera, F. Priolo, E. Napolitani, and A. Camera: Nucl. Instrum. Methods Phys. Res., Sect. B 186 (2002) 287.

6
- 0043060338
- T. Ito, T. Iinuma, A. Murakoshi, H. Akutsu, K. Suguro, T. Arikado, K. Okumura, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama, and T. Kushida: Jpn. J. Appl. Phys. 41 (2002) 2394.
- (2002) Jpn. J. Appl. Phys , vol.41 , pp. 2394
- Ito, T.¹ Iinuma, T.² Murakoshi, A.³ Akutsu, H.⁴ Suguro, K.⁵ Arikado, T.⁶ Okumura, K.⁷ Yoshioka, M.⁸ Owada, T.⁹ Imaoka, Y.¹⁰ Murayama, H.¹¹ Kushida, T.¹²

7
- 33646934384
- G. Yon, G. Buh, T. Park, S. Hong, Y. Shin, U. Chung, and J. Moon: Jpn. J. Appl. Phys. 45 (2006) 2961.
- (2006) Jpn. J. Appl. Phys , vol.45 , pp. 2961
- Yon, G.¹ Buh, G.² Park, T.³ Hong, S.⁴ Shin, Y.⁵ Chung, U.⁶ Moon, J.⁷

8
- 0032205186
- J. P. Hebb, K. F. Jensen, and J. Thomas: IEEE Trans. Semicond. Manuf. 11 (1998) 607.
- (1998) IEEE Trans. Semicond. Manuf , vol.11 , pp. 607
- Hebb, J.P.¹ Jensen, K.F.² Thomas, J.³

9
- 34547856722
- Y. B. Chen, Z. M. Zhang, and P. Timans: J. Heat Transfer 54 (2006) 2057.
- (2006) J. Heat Transfer , vol.54 , pp. 2057
- Chen, Y.B.¹ Zhang, Z.M.² Timans, P.³

10
- 45749116921
- Z. Nenyei, J. Niess, S. Buschbaum, W. Dietl, R. Berger, S. Miethaner, H. Gruber, W. Wahlich, and S. Chamberlain: Proc. Electrochem. Soc. 2002-11, 2002, p. 261.
- (2002) Proc. Electrochem. Soc , vol.2002 -11 , pp. 261
- Nenyei, Z.¹ Niess, J.² Buschbaum, S.³ Dietl, W.⁴ Berger, R.⁵ Miethaner, S.⁶ Gruber, H.⁷ Wahlich, W.⁸ Chamberlain, S.⁹

11
- 0020734758
- G. G. Bentini and L. Correra: J. Appl. Phys. 54 (1983) 2057.
- (1983) J. Appl. Phys , vol.54 , pp. 2057
- Bentini, G.G.¹ Correra, L.²

12
- 34547875070
- H. Habuka, A. Hara, T. Karasawa, and M. Yoshioka: Jpn. J. Appl. Phys. 46 (2007) 937.
- (2007) Jpn. J. Appl. Phys , vol.46 , pp. 937
- Habuka, H.¹ Hara, A.² Karasawa, T.³ Yoshioka, M.⁴

13
- 0004040706
- Academic Press, CA
- E. D. Palik: Handbook of Optical Constants of Solids (Academic Press, CA, 1985).
- (1985) Handbook of Optical Constants of Solids
- Palik, E.D.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.