Structural and optical characterization of semiconducting TiN nanoparticles thin film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 1, 2007, Pages 356-361

  Tanemura, Sakae ^a   Miao, Lei ^b   Kajino, Yoichi ^b   Tanemura, Masaki ^b   Toh, Shoichi ^c   Kaneko, Kenji ^c   Mori, Yukimasa ^d  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

^d NGK INSULATORS LTD   (Japan)

Author keywords

Complex dielectric constant; Gas aggregation method; Nanoparticle TiN; Optical band gap; Reactive sputtering; Semiconducting TiN thin film; Spectroscopic ellipsometry; TEM analysis; XPS analysis

Indexed keywords

REACTIVE SPUTTERING; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; THERMAL EFFECTS;

COMPLEX DIELECTRIC CONSTANT; OPTICAL BAND GAP; SEMICONDUCTING TIN THIN FILM;

THIN FILMS;

EID: 34547865065     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.356     Document Type: Article

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