SCOPUS 정보 검색 플랫폼

Volumn 46, Issue 1-3, 2007, Pages

Surface reaction enhancement by UV irradiation during Si etching process with chlorine atom beam

Author keywords

Defect generation; Etching reaction; Neutral beam etching; Plasma etching; UV photon assisted reaction

Indexed keywords

CHLORINE; CRYSTAL DEFECTS; PLASMA ETCHING; SILICON; ULTRAVIOLET RADIATION;

DEFECT GENERATION; ETCHING REACTION; NEUTRAL BEAM ETCHING; PHOTON IRRADIATION; UV PHOTON ASSISTED REACTION;

SURFACE REACTIONS;

EID: 34547859668 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.L64 Document Type: Article

Times cited : (32)

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