Ion assisted deposition of crystalline TiNi thin films by electron cyclotron resonance plasma enhanced sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 6 A, 1997, Pages 3629-3634

  Mišina, Martin ^a,b   Setsuhara, Yuichi ^a   Miyake, Shoji ^a  

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE OF MATHEMATICS   (Czech Republic)

Author keywords

Crystallization; ECR; Ion assisted deposition; RBS; Sputtering; Texture; TiNi; XRD

Indexed keywords

ION ASSISTED DEPOSITION; ION FLUX DENSITY; ION TO METAL FLUX RATIO; MAGNETIC MIRROR PLASMA CONFINEMENT;

COMPOSITION; CRYSTAL STRUCTURE; CRYSTALLIZATION; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; TEXTURES; TITANIUM NITRIDE; X RAY DIFFRACTION;

THIN FILMS;

EID: 0031167533     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.3629     Document Type: Article

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