Preparation and electrical properties of Ca5Si3 and Sr5Si3 powders

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8226-8229

  Inaba, T ^a   Kato, A ^b   Miura, K ^a   Akasaka, M ^c   Iida, T ^c   Momose, Y ^a   Tatsuoka, H ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b FDK CORPORATION   (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Electrical properties and measurements; Semiconductors; Silicides; Structural properties

Indexed keywords

BAND STRUCTURE; ELECTRIC PROPERTIES; FERMI LEVEL; MEASUREMENT THEORY; SEMICONDUCTOR MATERIALS; SILICIDES; STRUCTURAL PROPERTIES;

ELECTRONIC BAND STRUCTURES; THERMOELECTRIC PROPERTIES;

CALCIUM COMPOUNDS;

EID: 34547769744     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.048     Document Type: Article

References (23)

1. Makita Y. In: Mc Connel (Ed). The First NREL Conference on Future Generation Photovoltaic Technologies (1997), AIP, New York 3
2. Matsui H., Kuramoto M., Ono T., Nose H., Tatsuoka H., and Kuwabara H. J. Cryst. Growth 237/239 (2002) 2121
3. Imai Y., and Watanabe A. Intermetallic 10 (2002) 333
4. Hosono T., Kuramoto M., Matsuzawa Y., Momose Y., Maeda Y., Matsuyama T., Tatsuoka H., Fukuda Y., Hashimoto S., and Kuwabara H. Appl. Surf. Sci. 216 (2003) 620
5. Miura K., Ohishi T., Inaba T., Mizuyoshi Y., Takagi N., Matsuyama T., Momose Y., Koyama T., Hayakawa Y., and Tatsuoka H. Thin Solid Films 508 (2006) 74
6. Nakamura T., Suemasu T., Takakura K., Hasegawa F., Wakahara A., and Imai M. Appl. Phys. Lett. 81 (2002)
7. Inomata Y., Nakamura T., Suemasu T., and Hasegawa F. Jpn. J. Appl. Phys., Part 2 43 (2004) L478
8. Imai Y. Appl. Phys. Lett. 81 (2002) 1034
9. Imai M., Naka T., Furubayashi T., Abe H., Nakama T., and Yagasaki K. Appl. Phys. Lett. 86 (2005) 032102
10. Manfrinetti P., Fornasini M.L., and Palenzona A. Intermetallics 8 (2000) 223
11. Palenzona A., and Pani M. J. Alloys Compd. 373 (2004) 214
12. Eisenmann B., and Schafer H. Z. Naturforsch. 29B (1974) 460
13. Nagorsen G., Rocktaeschel G., Schaefer H., and Weiss A. Z. Naturforsch. 22b (1967) 101
14. Gottlieb U., Madar R., and Laborde O. In: Tang R.T., Maex K., Pellegrini P.W., and Allen L.H. (Eds). Silicide Thin Films - Fabrication, Properties and Applications (1996), MRS, Pittsburgh, Pennsylvania 581
15. Witanachchi S., Mourad H.A., and Mukherjee P. J. Appl. Phys. 99 (2006) 73710
16. Gottlieb U., Lambert-Andron B., Nava F., Affronte M., Laborde O., Rouault A., and Madar R. J. Appl. Phys. 78 (1995) 3902
17. Bost M.C., and Mahan J.E. J. Appl. Phys. 58 (1985) 2629
18. Hohenberg P., and Kohn W. Phys. Rev., B 136 (1964) 864
19. Kohn W., and Sham L.J. Phys. Rev., A 140 (1965) 1133
20. Hartwigsen C., Goedecker S., and Hutter J. Phys. Rev., B 58 (1998) 3641
21. Goedecker S., Teter M., and Hutter J. Phys. Rev., B 54 (1996) 1703
22. Nishino Y. Mater. Trans. 42 (2001) 902
23. Aryasetiawan F., and Gunnarsson O. Rep. Prog. Phys. 61 (1998) 237