Anomalous metal-to-insulator transition in FeSi films deposited on SiO 2/Si substrates

Journal of Applied Physics

Volumn 99, Issue 7, 2006, Pages

  Witanachchi, S ^a   Abou Mourad, H ^a   Mukherjee, P ^a  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FERMI LEVEL PINNING; INTERFACIAL RESISTANCE; OXIDE BARRIER; OXIDE LAYER;

ELECTRIC INSULATORS; PHASE TRANSITIONS; SILICA; SUBSTRATES; THERMAL EFFECTS;

THIN FILMS;

EID: 33645918988     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2185831     Document Type: Article

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