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Volumn 4344, Issue 1, 2001, Pages 815-826
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Redefining critical in critical dimension metrology
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Author keywords
Accuracy; Calibration; CD metrology; Linewidth standards; Process control
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Indexed keywords
CALIBRATION;
CONFORMAL MAPPING;
MEASUREMENT THEORY;
PROCESS CONTROL;
SCANNING ELECTRON MICROSCOPY;
STANDARDS;
CRITICAL DIMENSION (CD) METROLOGY;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0034763821
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.436721 Document Type: Article |
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Times cited : (4)
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References (11)
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