|
|
Volumn 192-193, Issue , 2007, Pages 55-59
|
|
Characteristics of ZnO thin film deposited by ion beam sputter
|
|
Author keywords
Free standing diamond; Ion beam sputter; ZnO film
|
|
Indexed keywords
ACOUSTIC SURFACE WAVE DEVICES;
ION BEAM ASSISTED DEPOSITION;
LIGHT EMITTING DIODES;
PIEZOELECTRIC DEVICES;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC OXIDE;
DEPOSITS;
DIAMOND FILMS;
ELECTRIC PROPERTIES;
ION BEAMS;
METALLIC FILMS;
MOLECULES;
PHOTOELECTRONS;
PIEZOELECTRICITY;
SUBSTRATES;
THIN FILM DEVICES;
X RAY DIFFRACTION;
FREE-STANDING DIAMOND;
ION BEAM SPUTTER;
PACKING DENSITY;
THIN FILMS;
ZINC OXIDE;
FREE-STANDING DIAMOND FILMS;
FULL WIDTH OF HALF MAXIMUM;
ION BEAM SPUTTER;
ION BEAM SPUTTERING DEPOSITION;
ION BEAM SPUTTERING METHODS;
PIEZOELECTRIC PROPERTY;
PIEZOELECTRIC THIN FILM DEVICES;
ZNO FILMS;
|
|
EID: 34547503787
PISSN: 09240136
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jmatprotec.2007.04.029 Document Type: Article |
|
Times cited : (17)
|
|
References (15)
|
