Epitaxial electrodeposition of freestanding large area single crystal substrates

Applied Physics Letters

Volumn 90, Issue 26, 2007, Pages

  Shin, Jae Wook ^a   Standley, Adam ^a   Chason, Eric ^a  

^a BROWN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; ELECTRODEPOSITION; EPITAXIAL GROWTH; ETCHING; SINGLE CRYSTALS; X RAY DIFFRACTION;

EPITAXIAL ELECTRODEPOSITION; SINGLE CRYSTAL FILMS; SINGLE CRYSTAL METAL FILMS; SINGLE CRYSTAL SUBSTRATES;

SUBSTRATES;

EID: 34547467206     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2752531     Document Type: Article

References (24)

1. D. Dimos, P. Chaudhari, and J. Mannhart, Phys. Rev. B 41, 4038 (1990).
2. A. Goyal, N. Rutter, C. Cantoni, and D. F. Lee, Physica C 426-431, 1083 (2005).
3. M. A. Green, K. Emery, D. L. King, Y. Hisikawa, and W. Warta, Prog. Photovoltaics 14, 45 (2006).
4. S. M. Spearing, Acta Mater. 48, 179 (2000).
5. A. Rajamani, B. W. Sheldon, E. Chason, and A. Bower, Appl. Phys. Lett. 81, 1204 (2002).
6. K. Hoshikawa, H. Nakanishi, K. Kohda, and M. Sasaura, J. Cryst. Growth 94, 643 (1989).
7. S. Kimura and K. Kitamura, J. Am. Ceram. Soc. 75, 1440 (1992).
8. J. Evers, P. Klüfers, R. Staudigl, and P. Stallhofer, Angew. Chem., Int. Ed. 42, 5684 (2003).
9. Y. Kamada, Y. Hitomi, T. Kingetsu, and M. Yamamoto, J. Appl. Phys. 90, 5104 (2001).
10. N. M. Markovic and P. N. Ross, Jr., J. Vac. Sci. Technol. A 11, 2225 (1993).
11. F. J. Lamelas, C. H. Lee, Hui He, W. Vavra, and Roy Clarke, Phys. Rev. B 40, 5837 (1989).
12. C. H. Lee, Hui He, F. Lamelas, W. Vavra, C. Uher, and Roy Clarke, Phys. Rev. Lett. 62, 653 (1989).
13. R. J. Molnar, W. Götz, L. T. Romano, and N. M. Johnson, J. Cryst. Growth 178, 147 (1997).
14. F. Kawamura, T. Iwahashi, K. Omae, M. Morishita, M. Yoshimura, Y. Mori, and T. Sasaki, Jpn. J. Appl. Phys., Part 2 42, L4 (2003).
15. T. P. Moffat, J. Electrochem. Soc. 142, 3767 (1995).
16. E. Yablonovitch, T. Gmitter, J. P. Harbison, and R. Bhat, Appl. Phys. Lett. 51, 2222 (1987).
17. M. Konagai, M. Suginoto, and K. Takahashi, J. Cryst. Growth 45, 277 (1978).
18. M. G. Lagally, MRS Bull. 32, 57 (2007).
19. M. M. Robert, L. J. Klein, D. E. Savage, K. A. Slinker, M. Friesen, G. Celler, M. A. Eriksson, and M. G. Lagally, Nat. Mater. 5, 388 (2006).
20. U. Gösele, Y. Bluhm, G. Kästner, P. Kopperschmidt, G. Kräuter, R. Scholz, A. Schumacher, St. Senz, Q.-Y. Tong, L.-J. Huang, Y.-L. Chao, and T. H. Lee, J. Vac. Sci. Technol. A 17, 1145 (1999).
21. A. Goyal, F. A. List, J. Mathis, M. Paranthaman, E. D. Specht, D. P. Norton, C. Park, D. F. Lee, D. M. Kroeger, D. K. Christen, J. D. Budai, and P. M. Martin, J. Supercond. 11, 481 (1998).
22. S. R. Foltyn, P. N. Arendt, Q. X. Jia, H. Wang, J. L. MacManus-Driscoll, S. Kreiskott, R. F. DePaula, L. Stan, J. R. Groves, and P. C. Dowden, Appl. Phys. Lett. 82, 4519 (2003).
23. J. S. Im, R. S. Sposili, and M. A. Crowder, Appl. Phys. Lett. 70, 3434 (1997).
24. L. Sun, C. L. Chien, and P. C. Searson, Chem. Mater. 16, 3125 (2004).