Control of atomic layer degradation on Si substrate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1062-1067

  Nakamura, Y ^a   Tatsumi, T ^a   Kobayashi, S ^a   Kugimiya, K ^a   Harano, T ^a   Ando, A ^a   Kawase, T ^b   Hamaguchi, S ^b   Iseda, S ^a  

^a SONY CORPORATION   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; DEGRADATION; FLUOROCARBONS; MOLECULAR DYNAMICS; SUBSTRATES;

ATOMIC LAYER DEGRADATION; FLUOROCARBON POLYMERS; ION ENERGY; ION PENETRATION;

SILICON COMPOUNDS;

EID: 34547351357     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2713114     Document Type: Article

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