Structure and chemical properties of molybdenum oxide thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1166-1171

  Ramana, C V ^a   Atuchin, V V ^b   Pokrovsky, L D ^b   Becker, U ^a   Julien, C M ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROPERTIES; ELECTRON DIFFRACTION; MICROSTRUCTURE; PULSED LASER DEPOSITION; THIN FILMS;

MOLYBDENUM OXIDE; OXYGEN PRESSURE; POLYCRYSTALLINE FILMS;

MOLYBDENUM COMPOUNDS;

EID: 34547329369     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2747628     Document Type: Article

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