In situ measurements of thickness changes and mechanical stress upon gasochromic switching of thin MoOx films

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 7632-7636

  Okumu, J ^a,b   Koerfer, F ^b   Salinga, C ^b   Wuttig, M ^b  

^a KENYATTA UNIVERSITY   (Kenya)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRONIC STRUCTURE; HEATING; LIGHT ABSORPTION; LIGHT REFLECTION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; SENSORS; STOICHIOMETRY; STRESS ANALYSIS; SWITCHING; THIN FILMS; X RAY ANALYSIS;

CORNER SHARING; GASOCHROMIC SWITCHING; IN SITU MEASUREMENTS; SUBSTRATE CURVATURES;

MOLYBDENUM COMPOUNDS;

EID: 3142772156     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1728309     Document Type: Article

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