Effects of laser-induced heating on Raman stress measurements of silicon and silicon-germanium structures

Journal of Applied Physics

Volumn 101, Issue 12, 2007, Pages

  Georgi, Carsten ^a   Hecker, Michael ^a   Zschech, Ehrenfried ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; STRESS MEASUREMENT;

HEATING EFFECTS; LASER INDUCED HEATING; RAMAN STRESS MEASUREMENTS; SILICON GERMANIUM STRUCTURES;

LASER HEATING;

EID: 34547278929     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2743882     Document Type: Article

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