Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source

Review of Scientific Instruments

Volumn 78, Issue 6, 2007, Pages

  Hund, Markus ^a   Herold, Hans ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPES; NANOSTRUCTURED MATERIALS; PLASMA ETCHING; PLASMA SOURCES; POLYMER FILMS;

AGGRESSIVE LIQUIDS; HARSH TREATMENTS; RADIO FREQUENCY; SAMPLE TREATMENT;

SCANNING PROBE MICROSCOPY;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; GAS; HEATING; INSTRUMENTATION; LABORATORY DIAGNOSIS; MATERIALS TESTING; METHODOLOGY; PILOT STUDY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; SYSTEM ANALYSIS; TRANSDUCER;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GASES; HEATING; MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; MINIATURIZATION; PILOT PROJECTS; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SPECIMEN HANDLING; SYSTEMS INTEGRATION; TRANSDUCERS;

EID: 34547278120     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2742623     Document Type: Article

References (22)

1. G. Binnig, H. Rohrer, C. Gerber, and E. Weibel, Phys. Rev. Lett. 49, 57 (1982).
2. G. Binnig, C. F. Quate, and C. Gerber, Phys. Rev. Lett. 56, 930 (1986).
3. R. J. Colton, J. Vac. Sci. Technol. B 22, 1609 (2004).
4. A. J. van Roosmalen, J. A. G. Baggerman, and S. J. H. Brader, Dry Etching for VLSI (Plenum, New York, 1991).
5. M. Köhler, tzverfahren ür die Mikrotechnik (Wiley-VCH, Weinheim, 1998).
6. C.-M. Chan, T.-M. Ko, and H. Hiraoka, Surf. Sci. Rep. 24, 1 (1996).
7. C. Harrison, M. Park, P. Chaikin, R. A. Register, D. H. Adamson, and N. Yao, Macromolecules 31, 2185 (1998).
8. R. Magerle, Phys. Rev. Lett. 85, 2749 (2000).
9. M. Konrad, A. Knoll, G. Krausch, and R. Magerle, Macromolecules 33, 5518 (2000).
10. Y. Yin, J. Messier, and J. A. Hopwood, IEEE Trans. Plasma Sci. 27, 1516 (1999).
11. H. Yoshiki and Y. Horiike, Jpn. J. Appl. Phys., Part 2 40, L360 (2001).
12. M. Miclea, K. Kunze, G. Musa, J. Franzke, and K. Niemax, Spectrochim. Acta, Part B 56, 37 (2001).
13. S. M. Markakis and P. D. Lippire, U.S. Patent No. 7,076,996 (18 July 2006).
14. All Purpose Experimental Chamber, Agilent Technologies, USA.
15. K. Terashima, Y. Taniguchi, N. Yamaguchi, Y. Takamura, and T. Yoshida, Thin Solid Films 345, 146 (1999).
16. M. Hund and H. Herold, German Patent No. 10 2004 043 191 (24 May 2006); International Publication No. WO 2005/083717 A1 (9 September 2005); U.S. Patent Application No. 10/598,045 (pending).
17. M. Hund and H. Herold, German Patent No. 10 2004 043 191 (24 May 2006); International Publication No. WO 2005/083717 A1 (9 September 2005); U.S. Patent Application No. 10/598,045 (pending).
18. M. Hund and H. Herold, German Patent No. 10 2004 043 191 (24 May 2006); International Publication No. WO 2005/083717 A1 (9 September 2005); U.S. Patent Application No. 10/598,045 (pending).
19. E. Max, M. Hund, and L. Tsarkova (unpublished).
20. GWYDDION, http://gwyddion.net
21. V. Olszowka, M. Hund, V. Kuntermann, S. Scherdel, L. Tsarkova, A. Böker, and G. Krausch, Soft Matter 2, 1089 (2006).
22. S. Scherdel, S. Wirtz, N. Rehse, and R. Magerle, Nanotechnology 17, 881 (2006).