Miniaturization of inductively coupled plasma sources

IEEE Transactions on Plasma Science

Volumn 27, Issue 5, 1999, Pages 1516-1524

  Yin, Yu ^a   Messier, Jason ^a   Hopwood, Jeffrey A ^a  

^a Northeastern University   (United States)

Author keywords

Inductively coupled plasma (icp); Microelectromechanical systems (mems)

Indexed keywords

INDUCTIVELY COUPLED PLASMAS (ICP);

ELECTRIC COILS; ELECTRIC DISCHARGES; ELECTRONS; INTERFEROMETRY; MICROELECTROMECHANICAL DEVICES; MICROWAVE MEASUREMENT; PLASMA COLLISION PROCESSES; PLASMA DEVICES; PLASMA PROBES; PLASMA SHEATHS;

PLASMA SOURCES;

EID: 0033204541     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.799834     Document Type: Article

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