Low dielectric constant materials: Challenges of plasma damage

ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

Volumn , Issue , 2006, Pages 291-294

  Baklanov, M R ^a   Urbanowicz, A ^a   Mannaert, G ^a   Vanhaelemeersch, S ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; DEGRADATION; FREE RADICALS; HELIUM; HYDROGEN; PERMITTIVITY; PLASMA ETCHING; SURFACE CHEMISTRY;

CLEANING PLASMA; PLASMA DAMAGE; STRIP PLASMAS;

DIELECTRIC MATERIALS;

EID: 34547270303     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSICT.2006.306210     Document Type: Conference Paper

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