Effects of fluorine dimer excimer laser radiation on the optical transmission and defect formation of various types of synthetic SiO2 glasses

Applied Physics Letters

Volumn 74, Issue 19, 1999, Pages 2755-2757

  Hosono, Hideo ^a   Mizuguchi, Masafumi ^a   Kawazoe, Hiroshi ^a   Ogawa, Tohru ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; DOPING (ADDITIVES); ELECTRON SPIN RESONANCE SPECTROSCOPY; EXCIMER LASERS; FLUORINE; LASER PULSES; LIGHT TRANSMISSION;

DRY SILICA GLASS; FLUORINE DIMER EXCIMER LASERS; FLUORINE-DOPED SILICA GLASS; FLUORINE-FREE SILICA GLASS; WET SILICA GLASS;

FUSED SILICA;

EID: 0032606677     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124004     Document Type: Article

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