F-doped and H2-impregnated synthetic SiO2 glasses for 157 nm optics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3280-3284

  Mizuguchi, Masafumi ^a   Skuja, Linards ^a,c   Hosono, Hideo ^a   Ogawa, Tohru ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^c UNIVERSITY OF LATVIA   (Latvia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273253     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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