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Volumn 18, Issue 30, 2007, Pages
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In situ growth rate measurements during plasma-enhanced chemical vapour deposition of vertically aligned multiwall carbon nanotube films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS CARBON;
FILM GROWTH;
GROWTH RATE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFLECTION;
THICK FILMS;
INITIAL GROWTH RATE;
REFLECTIVITY MEASUREMENTS;
THERMAL CVD GROWTH;
MULTIWALLED CARBON NANOTUBES (MWCN);
CARBON;
IRON;
NANOTUBE;
SILICON;
ARTICLE;
CATALYST;
CHEMICAL REACTION;
FILM;
GROWTH RATE;
LASER;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRIORITY JOURNAL;
VAPOR;
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EID: 34547165049
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/18/30/305702 Document Type: Article |
Times cited : (14)
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References (13)
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