Nano-scale surface modification using gas cluster ion beams - A development history and review of the Japanese nano-technology program

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8579-8587

  Yamada, Isao ^a   Toyoda, Noriaki ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Cluster ion beam assisted deposition; Cluster ion beams; Lateral sputtering; Shallow implantation; Surface smoothing

Indexed keywords

GAS CLUSTER ION (GCIB) BOMBARDMENT; HIGH ENERGY DENSITIES;

ION BOMBARDMENT; ION IMPLANTATION; NANOTECHNOLOGY; SPUTTERING; SURFACE CLEANING; SURFACE TREATMENT; THIN FILMS;

ION BEAM ASSISTED DEPOSITION;

ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; ION IMPLANTATION; NANOTECHNOLOGY; SPUTTERING; SURFACE CLEANING; SURFACE TREATMENT; THIN FILMS;

EID: 34447538002     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.02.081     Document Type: Review

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