MgF2 and LaF3 thin film formation with gas cluster ion beam assisted deposition

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8620-8623

  Toyoda, Noriaki ^a   Yamada, Isao ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Fluoride film; Gas cluster ion beam; Roughness; Smoothing

Indexed keywords

FLUORIDE FILM; GAS CLUSTER ION BEAM; ION CURRENT DENSITY; SMOOTHING;

ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MULTILAYERS; SURFACE ROUGHNESS;

SURFACE TREATMENT;

ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MULTILAYERS; SURFACE ROUGHNESS; SURFACE TREATMENT;

EID: 34447532096     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.02.070     Document Type: Article

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