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Volumn 22, Issue 6, 2007, Pages 1551-1557

Crystal structure and microstructure of epitaxial Pb(Zr,Ti) O3 films consisting of mixed phases with tetragonal and rhombohedral symmetries grown on (100)cSrRuO3// (100)SrTiO3 substrate by metalorganic chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CURIE TEMPERATURE; FILM THICKNESS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

EID: 34347272594     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2007.0190     Document Type: Article
Times cited : (18)

References (16)
  • 3
    • 0034909148 scopus 로고    scopus 로고
    • 3 thin films with coexisting tetragonal and rhombohedral phases
    • 3 thin films with coexisting tetragonal and rhombohedral phases. Phys. Rev. B 63, 132101 (2001).
    • (2001) Phys. Rev. B , vol.63 , pp. 132101
    • Oh, S.H.1    Jang, H.M.2
  • 8
    • 34347222995 scopus 로고    scopus 로고
    • 3 thin films with 100% polar-axis-orientation and their electrical properties, in Ferroelectric Thin Films XII, edited by S. Hoffmann-Eifert, H. Funakubo, V. Joshi, A.I. Kingon, and I.P. Koutsaroff (Mater. Res. Soc. Symp. Proc. 784, Warrendale, PA, 2004), C6.2.1.
    • 3 thin films with 100% polar-axis-orientation and their electrical properties, in Ferroelectric Thin Films XII, edited by S. Hoffmann-Eifert, H. Funakubo, V. Joshi, A.I. Kingon, and I.P. Koutsaroff (Mater. Res. Soc. Symp. Proc. 784, Warrendale, PA, 2004), C6.2.1.
  • 9
    • 0034290924 scopus 로고    scopus 로고
    • 3 thin film prepared by source gas pulse-introduced metalorganic chemical vapor deposition
    • 3 thin film prepared by source gas pulse-introduced metalorganic chemical vapor deposition. Jpn. J. Appl. Phys., Part 2 39, L996 (2000).
    • (2000) Jpn. J. Appl. Phys., Part 2 , vol.39
    • Nagashima, K.1    Aratani, M.2    Funakubo, H.3
  • 16
    • 34347209525 scopus 로고    scopus 로고
    • 3 Substrates By Metalorganic Chemical Vapor Deposition, in Ferroelectric Thin Films XIII, edited by R. Ramesh, J.-P. Maria, M. Alexe, V. Joshi (Mater. Res. Soc. Symp. Proc. 902E, Warrendale, PA, 2006), 0902-T03-29.1.
    • 3 Substrates By Metalorganic Chemical Vapor Deposition, in Ferroelectric Thin Films XIII, edited by R. Ramesh, J.-P. Maria, M. Alexe, V. Joshi (Mater. Res. Soc. Symp. Proc. 902E, Warrendale, PA, 2006), 0902-T03-29.1.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.