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Volumn 56, Issue 1, 2007, Pages 541-544

Fabrication of Ultra Precision Optics by Numerically Controlled Local Wet Etching

Author keywords

Etching; Numerical control; Optical

Indexed keywords

FUNCTIONALLY GRADED MATERIALS; GEOMETRICAL OPTICS; NOZZLES; PHOTOMASKS; SURFACE ROUGHNESS; WET ETCHING;

EID: 34250166534     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2007.05.129     Document Type: Article
Times cited : (44)

References (9)
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    • Computer Numerically Controlled Plasma Chemical Vaporization Machining Using a Pipe Electrode for Optical Fabrication
    • H. Takino N. Shibata H. Itoh T. Kobayashi H. Tanaka M. Ebi K. Yamamura Y. Sano Y. Mori Computer Numerically Controlled Plasma Chemical Vaporization Machining Using a Pipe Electrode for Optical Fabrication Appl. Opt. 37 1998 5120 5198
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    • Takino, H.1    Shibata, N.2    Itoh, H.3    Kobayashi, T.4    Tanaka, H.5    Ebi, M.6    Yamamura, K.7    Sano, Y.8    Mori, Y.9
  • 4
    • 0036642132 scopus 로고    scopus 로고
    • Fabrication of Optics by Use of Plasma Chemical Vaporization Machining with a Pipe Electrode
    • H. Takino N. Shibata H. Itoh T. Kobayashi K. Yamamura Y. Sano Y. Mori Fabrication of Optics by Use of Plasma Chemical Vaporization Machining with a Pipe Electrode Appl. Opt. 41 2002 3971 3977
    • (2002) Appl. Opt. , vol.41 , pp. 3971-3977
    • Takino, H.1    Shibata, N.2    Itoh, H.3    Kobayashi, T.4    Yamamura, K.5    Sano, Y.6    Mori, Y.7
  • 5
    • 2042540731 scopus 로고    scopus 로고
    • Thinning of Silicon-on-insulator Wafers by Numerically Controlled Plasma Chemical Vaporization Machining
    • Y. Mori K. Yamamura Y. Sano Thinning of Silicon-on-insulator Wafers by Numerically Controlled Plasma Chemical Vaporization Machining Rev. Sci. Instrum. 75 2004 942 946
    • (2004) Rev. Sci. Instrum. , vol.75 , pp. 942-946
    • Mori, Y.1    Yamamura, K.2    Sano, Y.3
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    • Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining
    • M. Shibahara K. Yamamura Y. Sano T. Sugiyama K. Endo Y. Mori Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining Rev. Sci. Instrum. 76 2005 096103-1-4
    • (2005) Rev. Sci. Instrum. , vol.76
    • Shibahara, M.1    Yamamura, K.2    Sano, Y.3    Sugiyama, T.4    Endo, K.5    Mori, Y.6
  • 7
    • 85120214616 scopus 로고    scopus 로고
    • Yamamura, K., Yamauchi, K., Mimura, H., Sano, Yasuhisa Saito, A., Endo, K., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T., Mori, Y., 2003, Fabrication of Elliptical Mirror at Nanometer-level Accuracy for Hard X-ray Focusing by Numerically Controlled Plasma Chemical Vaporization Machining, Rev. Sci. Instrum., 74, 4549-4553.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.