Ultraprecision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8270-8276

  Yamamura, Kazuya ^a   Sano, Yasuhisa ^b   Shibahara, Masafumi ^a   Yamauchi, Kazuto ^b   Mimura, Hidekazu ^b   Endo, Katsuyoshi ^a   Mori, Yuzo ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NONE

Author keywords

Atmospheric pressure plasma; Numerically controlled figuring; Photomask substrate; Plasma chemical vaporization machining; Quartz crystal wafer; X ray mirror

Indexed keywords

ELECTRODES; HIGH PRESSURE EFFECTS; NUMERICAL METHODS; VAPORIZATION;

ATMOSPHERIC PRESSURE PLASMA; NUMERICALLY CONTROLLED FIGURING; PHOTOMASK SUBSTRATES; PLASMA CHEMICAL VAPORIZATION MACHINING; QUARTZ CRYSTAL WAFER; X-RAY MIRROR;

ATMOSPHERIC PRESSURE;

EID: 34249008304     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8270     Document Type: Article

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