Effects of dimensional nanoscaling on the optical and electrical properties of crystalline Si thin films

Journal of Applied Physics

Volumn 101, Issue 10, 2007, Pages

  Sharma, A K ^a,b   Logofatu P C ^c   Mayberry, C S ^a   Brueck, S R J ^b,d   Islam, N E ^b  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b University of New Mexico   (United States)

^c NATIONAL INSTITUTE FOR LASER   (Romania)

^d UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIMENSIONAL NANOSCALING; METAL SEMICONDUCTOR METAL STRUCTURES; SPECTRAL RESPONSE; ULTRAFAST TIME RESPONSE;

CRYSTALLINE MATERIALS; DARK CURRENTS; ELECTRIC PROPERTIES; OPTICAL PROPERTIES; PHOTOCURRENTS; QUANTUM EFFICIENCY; SILICON;

THIN FILMS;

EID: 34249912639     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2737983     Document Type: Article

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