Influence of film thickness on structural properties of microcrystalline silicon films

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2002, Pages 1266-1269

  Yoshioka, Y ^a   Matsuyama, Y ^a   Kamisako, K ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; GRAIN SIZE AND SHAPE; HYDROGEN; SILICON SOLAR CELLS; SURFACE ROUGHNESS; THICK FILMS;

CRYSTALLINITY; FILM THICKNESS; HYDROGEN RADICAL CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON FILMS; STRUCTURAL PROPERTIES; THIN FILM SOLAR CELL;

POLYSILICON;

EID: 0036948639     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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2. A. Heya, A. Masuda and H. Matsumura, "Mechanism of Low-temperature Crystallization of Amorphous Silicon by Atomic Hydrogen Anneal", J. Non-Cryst. Solids 266-269, 2000, pp. 619-623.
3. K. Saitoh, M. Kondo, M. Fukawa, T. Nishimiya and A. Matsuda, "Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon" Appl. Phys. Lett. 71, 1997, PP. 3403-3405.
4. K. Kamisako, N. Andoh, L. Lo, T. Kambashi, M. Hatta, H. Nagayoshi and T. Sameshima, "Characterization of Microcrystalline Silicon Films Prepared by Hydrogen-Radical CVD Method", Proc. of 2nd World Conference and Exhibition on Photovoltaic Solar Energy Conversion, 1998, pp. 869-871.
5. T. Ishitani, M. Hatta, Y. Kimura, T. Komuro, N. Andoh and K. Kamisako, "Evaluation of Microcrystalline Silicon Films with Double Layered Structure", Technical Digest of 11th International Photovoltaic Science and Engineering Conference, 1999, pp. 415-416.
6. T. Sameshima, K. Saitoh, N. Aoyama, S. Higashi, M. Kondo and A. Matsuda, "Electrical Properties of Pulsed Laser Crystallized Silicon Films" Jpn. J. Appl. Phys. 38, 1999, pp. 1892-1897.
7. A. Heya, A. Izumi, A. Masuda and H. Matsumura, "Control of Polycrystalline Silicon Structure by the Two-Step Deposition Method" Jpn. J. Appl. Phys. 39, 2000, pp. 3888-3895.