Device and circuit considerations for high performance SOI technologies

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 2000, Pages 29-

  Bryant, A ^a   Sleight, J ^a   Assaderaghi, F ^a   Shahidi, G ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; INTEGRATED CIRCUIT MANUFACTURE; MICROPROCESSOR CHIPS; PERFORMANCE; THRESHOLD VOLTAGE; TRANSISTORS; VOLTAGE CONTROL;

PARTIALLY DEPLETED SILICON ON INSULATOR TECHNOLOGY; THRESHOLD VOLTAGE CONTROL;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0034514293     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (0)