-
1
-
-
13844274047
-
-
4th ed., M.Schlesinger and M.Paunovic, Editors, Wiley, New York
-
J. W. Dini, Electrodeposition of Copper in Modern Electroplating, 4th ed., M. Schlesinger, and, M. Paunovic, Editors, p. 61, Wiley, New York (2000).
-
(2000)
Electrodeposition of Copper in Modern Electroplating
, pp. 61
-
-
Dini, J.W.1
-
2
-
-
0032166781
-
-
0018-8646
-
P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev. 0018-8646, 42, 567 (1998); J. D. Reid, Jpn. J. Appl. Phys., Part 1, 40, 2650 (2001).
-
(1998)
IBM J. Res. Dev.
, vol.42
, pp. 567
-
-
Andricacos, P.C.1
Uzoh, C.2
Dukovic, J.O.3
Horkans, J.4
Deligianni, H.5
-
3
-
-
0035300710
-
-
P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev. 0018-8646, 42, 567 (1998); J. D. Reid, Jpn. J. Appl. Phys., Part 1, 40, 2650 (2001).
-
(2001)
Jpn. J. Appl. Phys., Part 1
, vol.40
, pp. 2650
-
-
Reid, J.D.1
-
7
-
-
0037031494
-
-
D. M. Soares, S. Wasle, K. G. Weil, and K. Doblhofer, J. Electroanal. Chem., 532, 353 (2002).
-
(2002)
J. Electroanal. Chem.
, vol.532
, pp. 353
-
-
Soares, D.M.1
Wasle, S.2
Weil, K.G.3
Doblhofer, K.4
-
8
-
-
0037023119
-
-
G. G. Lang, M. Ujvari, and G. Horanyi, J. Electroanal. Chem., 522, 179 (2002).
-
(2002)
J. Electroanal. Chem.
, vol.522
, pp. 179
-
-
Lang, G.G.1
Ujvari, M.2
Horanyi, G.3
-
10
-
-
4944262095
-
-
C. Gabrielli, P. Mo̧ot́guy, H. Perrot, and R. Wiart, J. Electroanal. Chem., 572, 367 (2004).
-
(2004)
J. Electroanal. Chem.
, vol.572
, pp. 367
-
-
Gabrielli, C.1
Mo̧ot́guy, P.2
Perrot, H.3
Wiart, R.4
-
11
-
-
0029324881
-
-
Z. Nagy, J. B. Blaudeau, N. C. Hung, L. A. Curtiss, and D. J. Zurawski, J. Electrochem. Soc., 142, L87 (1995).
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 87
-
-
Nagy, Z.1
Blaudeau, J.B.2
Hung, N.C.3
Curtiss, L.A.4
Zurawski, D.J.5
-
13
-
-
33947302340
-
-
0003-2700 10.1021/ac60266a017
-
G. W. Tindall and S. Bruckenstein, Anal. Chem. 0003-2700 10.1021/ac60266a017, 40, 1402 (1968); U. Bertocci, Electrochim. Acta, 11, 1261 (1966).
-
(1968)
Anal. Chem.
, vol.40
, pp. 1402
-
-
Tindall, G.W.1
Bruckenstein, S.2
-
14
-
-
0010667834
-
-
G. W. Tindall and S. Bruckenstein, Anal. Chem. 0003-2700 10.1021/ac60266a017, 40, 1402 (1968); U. Bertocci, Electrochim. Acta, 11, 1261 (1966).
-
(1966)
Electrochim. Acta
, vol.11
, pp. 1261
-
-
Bertocci, U.1
-
15
-
-
0037617433
-
-
K. Doblhofer, S. Wasle, D. M. Soares, K. G. Weil, G. Weinberg, and G. Ertl, Z. Phys. Chem., 217, 479 (2003).
-
(2003)
Z. Phys. Chem.
, vol.217
, pp. 479
-
-
Doblhofer, K.1
Wasle, S.2
Soares, D.M.3
Weil, K.G.4
Weinberg, G.5
Ertl, G.6
-
16
-
-
0039116260
-
-
Plenum, New York
-
R. M. Smith and A. E. Martell, Critical Stability Constants, Inorganic Complexes, Vol. 4, Plenum, New York (1976).
-
(1976)
Critical Stability Constants, Inorganic Complexes
, vol.4
-
-
Smith, R.M.1
Martell, A.E.2
-
20
-
-
0031139531
-
-
M. Wang, Y. Zhang, and M. Muhammed, Hydrometallurgy, 45, 53 (1997).
-
(1997)
Hydrometallurgy
, vol.45
, pp. 53
-
-
Wang, M.1
Zhang, Y.2
Muhammed, M.3
-
28
-
-
0032669743
-
-
P. Broekmann, M. Wilms, M. Kruft, C. Stuhlmann, and K. Wandelt, J. Electroanal. Chem., 467, 307 (1999).
-
(1999)
J. Electroanal. Chem.
, vol.467
, pp. 307
-
-
Broekmann, P.1
Wilms, M.2
Kruft, M.3
Stuhlmann, C.4
Wandelt, K.5
-
29
-
-
11544338106
-
-
S. Wu, J. Lipkowski, T. Tyliszczak, and A.P Hitchcock, Prog. Surf. Sci., 50, 227 (1995).
-
(1995)
Prog. Surf. Sci.
, vol.50
, pp. 227
-
-
Wu, S.1
Lipkowski, J.2
Tyliszczak, T.3
Hitchcock, A.P.4
-
30
-
-
0004079078
-
-
Wiley-VCH, New York
-
C. H. Hamann, A. Hamnett, and W. Vielstich, Electrochemistry, p. 103, Wiley-VCH, New York (1998).
-
(1998)
Electrochemistry
, pp. 103
-
-
Hamann, C.H.1
Hamnett, A.2
Vielstich, W.3
-
31
-
-
33947152651
-
-
Plenum Press, New York
-
J. O'M. Bockris, B. E. Conway, and E. Yeager, Comprehensive Treatise of Electrochemistry, Vol. 1, p. 143, Plenum Press, New York (1980).
-
(1980)
Comprehensive Treatise of Electrochemistry
, vol.1
, pp. 143
-
-
Bockris, J.O'M.1
Conway, B.E.2
Yeager, E.3
|