Nanopattern transfer to Si O2 by ion track lithography and highly selective HF vapor etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 862-867

  Skupinski M ^a   Jensen, J ^a   Johansson, A ^a   Possnert, G ^a   Boman, M ^a   Hjort, K ^a   Razpet, A ^b  

^a UPPSALA UNIVERSITY   (Sweden)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ASPECT RATIO; ETCHING; HEAVY IONS; LITHOGRAPHY; NANOPORES; SILICON; VAPORS;

ION TRACK LITHOGRAPHY; PATTERN TRANSFER; POROUS ALUMINA MEMBRANE;

POROUS MATERIALS;

EID: 34249888718     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2738481     Document Type: Article

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