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Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 593-596

Wet and vapor etching of tracks produced in SiO2 by Ti ion irradiation

Author keywords

Ion tracks; Nano pores; Silicon dioxide

Indexed keywords

ACTIVATION ENERGY; CORRELATION METHODS; NANOSTRUCTURED MATERIALS; SILICA; TITANIUM COMPOUNDS; WET ETCHING;

EID: 33947699765     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.045     Document Type: Article
Times cited : (10)

References (9)
  • 7
    • 33947666284 scopus 로고    scopus 로고
    • 2 sur silicium : comportement sous irradiation avec des ions lourds, Universite de Caen/Basse-Normandie, Doctorate Dissertation (2005), (in French).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.