Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 2, 2007, Pages 410-417

  Zhang, Guo Jun ^a   Tanii, Takashi ^a   Kanari, Yuzo ^a   Ohdomari, Iwao ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Antibody; Attachment; Electron beam lithography; Nanopatterns; Self assembled monolayers; Silicon

Indexed keywords

(I ,J) CONDITIONS; ATOMIC FORCE (AF); EB LITHOGRAPHY; FEATURE SIZES; HIGH SPECIFICITY; HIGH-THROUGHPUT (HT); NANO ARRAYS; NANO-PATTERNS; NANOSCALE ARRAYS; NONSPECIFIC BINDINGS; SELF ASSEMBLED MONOLAYER (SAMS);

ACOUSTIC MICROSCOPES; AMPLITUDE MODULATION; ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; ELECTRON GUNS; ELECTRONICS INDUSTRY; FLUORESCENCE; FLUORESCENCE MICROSCOPY; LIGHT EMISSION; LUMINESCENCE; MICROELECTRONICS; MICROSCOPIC EXAMINATION; MISSILE BASES; OPTICAL DESIGN; PARTICLE BEAMS; SCANNING PROBE MICROSCOPY; SELF ASSEMBLED MONOLAYERS; WELL STIMULATION;

ELECTRON BEAM LITHOGRAPHY;

ANTIBODY; IMMUNOGLOBULIN G; N OCTADECYLTRIMETHOXYSILANE; N-OCTADECYLTRIMETHOXYSILANE; NANOMATERIAL; ORGANOSILICON DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRON; FLUORESCENCE MICROSCOPY; FLUORESCENT ANTIBODY TECHNIQUE; PROTEIN MICROARRAY; SURFACE PROPERTY;

ANTIBODIES; ELECTRONS; FLUORESCENT ANTIBODY TECHNIQUE, INDIRECT; IMMUNOGLOBULIN G; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, FLUORESCENCE; NANOSTRUCTURES; ORGANOSILICON COMPOUNDS; PROTEIN ARRAY ANALYSIS; SURFACE PROPERTIES;

EID: 34249849469     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.146     Document Type: Article

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