Comparison of the accuracies of two methods for the determination of the surface normal for x-ray photoelectron spectroscopy

Metrologia

Volumn 44, Issue 3, 2007, Pages 242-245

  Seah, M P ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANGLE MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTAL AXIS METHOD; SUBSTRATE INTENSITIES;

ELECTRON EMISSION;

EID: 34249732553     PISSN: 00261394     EISSN: 16817575     Source Type: Journal    
DOI: 10.1088/0026-1394/44/3/011     Document Type: Article

References (8)

1. Seah M P et al 2004 Surf. Interface Anal. 36 1269
2. Seah M P and Spencer S J 2005 Surf. Interface Anal. 37 731
3. Kim K J, Jang J S and Moon D W 2006 Metrologia 43 L28
4. Kim K J and Moon D W 1998 Surf. Interface Anal. 26 9
5. Seah M P and Spencer S J 2002 Surf. Interface Anal. 33 640
6. Seah M P 2005 Surf. Interface Anal. 37 300
7. Hirose K, Nohira H, Azuma K and Hattori T 2007 Prog. Surf. Sci. 82 3
8. Cumpson P J 2000 Surf. Interface Anal. 29 403