Poly(ether sulfone) as a negative resist for electron beam lithography

Applied Physics Letters

Volumn 90, Issue 20, 2007, Pages

  Bryce, R M ^a   Freeman, M R ^a   Aktary, M ^b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b Applied Nanotools Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON IRRADIATION; POLYMETHYL METHACRYLATES;

ELECTRON BEAM EXPOSURE; ELECTRON BEAM RESIST; MASK MATERIAL; POLY(ETHER SULFONE); SULFONES;

POLYETHERS;

EID: 34249018972     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2740582     Document Type: Article

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