Thermostable trilayer resist for niobium lift-off

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 122-126

  Dubos, P ^a   Charlat, P ^a   Crozes, Th ^a   Paniez, P ^b   Pannetier, B ^a  

^a CNRS   (France)

^b ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; MAGNETOMETERS; METALLIC FILMS; MULTILAYERS; NIOBIUM; PLASTIC COATINGS; POLYSULFONES; SQUIDS; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY; THERMODYNAMIC STABILITY;

SHADOW EVAPORATION; TRILAYER RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033683714     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591162     Document Type: Article

References (18)