Intensive light emission from SiCN films by reactive RF magnetron sputtering

Materials Chemistry and Physics

Volumn 103, Issue 2-3, 2007, Pages 456-460

  Du, X W ^a   Fu, Y ^a   Sun, J ^a   Yao, P ^a   Cui, L ^a  

^a TIANJIN UNIVERSITY   (China)

Author keywords

Carbon nitride; Photoluminescence gap; Sputtering; XPS

Indexed keywords

CARBON NITRIDE; LIGHT EMISSION; MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOLUMINESCENCE GAP; SILICON CARBONITRIDE (SICN);

SILICON COMPOUNDS;

EID: 34248680470     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2007.02.053     Document Type: Article

References (25)

1. Jedrzejowski P., Cizek J., Amassian A., Klemberg-Sapieha J.E., Vlcek J., and Martinu L. Thin Solid Films 447/448 (2004) 201
2. Xie E.Q., Ma Z.W., Lin H.F., Zhang Z.M., and He D.Y. Opt. Mater. 23 (2003) 151
3. Chen L.C., Chen C.K., Wei S.L., Bhusari D.M., Chen K.H., Chen Y.F., Jong Y.C., and Huang Y.S. Appl. Phys. Lett. 72 (1998) 2463
4. Barreca F., Fazio E., Neri F., and Trusso S. Thin Solid Films 433 (2003) 34
5. Sundaram K.B., and Alizadeh J. Thin Solid Films 370 (2000) 151
6. Smirnova T.P., Badalian A.M., Yakovkina L.V., Kaichev V.V., Bukhtiyarov V.I., Shmakov A.N., Asanov I.P., Rachlin V.I., and Fomina A.N. Thin Solid Films 429 (2003) 144
7. Park N.M., Kim S.H., and Sung G.Y. J. Appl. Phys. 94 (2003) 2725
8. Chena K.H., Wu J.J., Wen C.Y., Chen L.C., Fan C.W., Kuo P.F., Chen Y.F., and Huang Y.S. Thin Solid Films 355/356 (1999) 205
9. Lutz H., Bruns M., Link F., and Baumann H. Thin Solid Films 332 (1998) 230
10. Yamamoto K., Koga Y., and Fujiwara S. Diam. Relat. Mater. 10 (2001) 1921
11. Muehlhoff L., Chyke W.J., Bozack M.J., and Yates Jr. J.T. J. Appl. Phys. 60 (1986) 2842
12. Marton D., Boyd K.J., Al-Bayati A.H., Todorov S.S., and Rabalais J.W. Phys. Rev. Lett. 73 (1994) 118
13. Chattopadhyay S., Chen L.C., Wu C.T., Chen K.H., Wu J.S., Chen Y.F., Lehmann G., and Hess P. Appl. Phys. Lett. 79 (2001) 332
14. Chattopadhyay S., Chien S.C., Chen L.C., Chen K.H., and Lee H.Y. Diam. Relat. Mater. 11 (2002) 708
15. Noma T., Seo K.S., Kato H., Fujimaki M., and Ohki Y. Appl. Phys. Lett. 79 (2001) 1995
16. Chen T.P., Liu Y., Sun C.Q., Tse M.S., Hsieh J.H., Fu Y.Q., Liu Y.C., and Fung S. J. Phys. Chem. B 108 (2004) 16609
17. Zhang Z.J., Fan S., and Lieber C.M. Appl. Phys. Lett. 66 (1995) 3582
18. Wu X.C., Cai R.Q., Yan P.X., Liu W.M., and Tian J. Appl. Surf. Sci. 185 (2002) 262
19. Tong S., Liu X.N., Gao T., and Bao X.M. Appl. Phys. Lett. 71 (1997) 698
20. Song H.Z., Bao X.M., Li N.S., and Wu X.L. Appl. Phys. Lett. 72 (1998) 356
21. Geohegan D.B., Puretzky A.A., Duscher G., and Pennycook S.J. Appl. Phys. Lett. 72 (1998) 2987
22. Tohmon R., Shimogaichi Y., Mizuno H., Ohki Y., and Nagasawa Hama K. Phys. Rev. Lett. 62 (1989) 1388
23. Fu Z.P., Ming Li, Yang B.F., and Liu R.C. Thin Solid Films 389 (2001) 12
24. Kleinsorge B., Ferrari A.C., Robertson J., Milne W.I., Waidmann S., and Hearne S. Diam. Relat. Mater. 9 (2000) 643
25. Rodil S.E., Muhl S., Maca S., and Ferrari A.C. Thin Solid Films 433 (2003) 119