Rad-Pro: Effective software for modeling radiative properties in rapid thermal processing

13th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2005

Volumn , Issue , 2005, Pages 275-281

  Lee, B J ^a   Zhang, Z M ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; ELECTRIC CONDUCTIVITY; INTERNET PROTOCOLS; MATERIALS PROPERTIES; NITRIDES; NONMETALS; OPTICAL CONSTANTS; POLYSILICON; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; SILICA; SILICON NITRIDE; SPREADSHEETS; TEMPERATURE MEASUREMENT;

CALCULATION SCHEMES; DOPING EFFECTS; FILM COATINGS; MULTILAYER STRUCTURES; POLARIZATION STATES; RADIATIVE PROPERTIES; SILICON DIOXIDES; SOFTWARE TOOLS; TEMPERATURE DEPENDENCES;

SILICON WAFERS;

EID: 34248679527     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2005.1613719     Document Type: Conference Paper

References (15)

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