-
3
-
-
0037116538
-
-
B. H. Kind, H. Yan, B. Messer, M. Law, and P. Yang, Adv. Mater. (Weinheim, Ger.) 14, 158 (2002).
-
(2002)
Adv. Mater. (Weinheim, Ger.)
, vol.14
, pp. 158
-
-
Kind B., H.1
Yan, H.2
Messer, B.3
Law, M.4
Yang, P.5
-
4
-
-
0037016206
-
-
H. C. Jeon, Y. S. Jeong, T. W. Kang, T. W. Kim, K. J. Chung, K.-J. Chung, W. Jhe, and S. A. Song, Adv. Mater. (Weinheim, Ger.) 14, 1725 (2002).
-
(2002)
Adv. Mater. (Weinheim, Ger.)
, vol.14
, pp. 1725
-
-
Jeon H., C.1
Jeong Y., S.2
Kang T., W.3
Kim T., W.4
Chung K., J.5
Chung, K.-J.6
Jhe, W.7
Song S., A.8
-
5
-
-
2142771096
-
-
N. J. Craig, J. M. Taylor, E. A. Lester, C. M. Marcus, M. P. Hanson, and A. C. Gossard, Science 304, 565 (2004).
-
(2004)
Science
, vol.304
, pp. 565
-
-
Craig N., J.1
Taylor J., M.2
Lester E., A.3
Marcus C., M.4
Hanson M., P.5
Gossard A., C.6
-
8
-
-
0001215952
-
-
H. Cao, J. Y. Xu, W. H. Xiang, Y. Ma, S. H. Chang, S. T. Ho, and G. S. Solomon, Appl. Phys. Lett. 76, 3519 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 3519
-
-
Cao, H.1
Xu J., Y.2
Xiang W., H.3
Ma, Y.4
Chang S., H.5
Ho S., T.6
Solomon G., S.7
-
9
-
-
2542428542
-
-
E.-T. Kim, A. Madhukar, Z. Ye, and J. C. Campbell, Appl. Phys. Lett. 84, 3277 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 3277
-
-
Kim, E.-T.1
Madhukar, A.2
Ye, Z.3
Campbell J., C.4
-
10
-
-
21544483058
-
-
E. Leobandung, L. Guo, Y. Wang, and S. Y. Chou, Appl. Phys. Lett. 67, 938 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 938
-
-
Leobandung, E.1
Guo, L.2
Wang, Y.3
Chou S., Y.4
-
11
-
-
0001523332
-
-
S. H. Xin, P. D. Wang, A. Yin, C. Kim, M. Dobrowolska, J. L. Merz, and J. K. Furdyna, Appl. Phys. Lett. 69, 3884 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 3884
-
-
Xin S., H.1
Wang P., D.2
Yin, A.3
Kim, C.4
Dobrowolska, M.5
Merz J., L.6
Furdyna J., K.7
-
12
-
-
0000382265
-
-
H. Ishikuro, T. Fujii, T. Saraya, G. Hashiguchi, T. Hiramoto, and T. Ikoma, Appl. Phys. Lett. 68, 3585 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 3585
-
-
Ishikuro, H.1
Fujii, T.2
Saraya, T.3
Hashiguchi, G.4
Hiramoto, T.5
Ikoma, T.6
-
14
-
-
0002412473
-
-
K. Matsumoto, M. Ishii, K. Segawa, Y. Oka, B. J. Vartanian, and J. S. Harris, Appl. Phys. Lett. 68, 34 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 34
-
-
Matsumoto, K.1
Ishii, M.2
Segawa, K.3
Oka, Y.4
Vartanian B., J.5
Harris J., S.6
-
15
-
-
79955995398
-
-
T. W. Kim, D. C. Choo, J. H. Shim, and S. O. Kang, Appl. Phys. Lett. 80, 2168 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2168
-
-
Kim T., W.1
Choo D., C.2
Shim J., H.3
Kang S., O.4
-
16
-
-
13144282746
-
-
S. O. Cho, H. Y. Jung, and S. K. Ahn, Adv. Mater. (Weinheim, Ger.) 17, 120 (2005).
-
(2005)
Adv. Mater. (Weinheim, Ger.)
, vol.17
, pp. 120
-
-
Cho S., O.1
Jung H., Y.2
Ahn S., K.3
-
17
-
-
0346961341
-
-
S. Huang, S. Banerjee, R. T. Tung, and S. Oda, J. Appl. Phys. 94, 7261 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 7261
-
-
Huang, S.1
Banerjee, S.2
Tung R., T.3
Oda, S.4
-
18
-
-
1242332887
-
-
S. J. Lee, Y. S. Shim, H. Y. Cho, D. Y. Kim, T. W. Kim, and K. L. Wang, Jpn. J. Appl. Phys., Part 1 42, 7180 (2003).
-
(2003)
Jpn. J. Appl. Phys., Part 1
, vol.42
, pp. 7180
-
-
Lee S., J.1
Shim Y., S.2
Cho H., Y.3
Kim D., Y.4
Kim T., W.5
Wang K., L.6
-
19
-
-
0037249238
-
-
S. Huang, S. Banerjee, R. T. Tung, and S. Oda, J. Appl. Phys. 93, 576 (2003).
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 576
-
-
Huang, S.1
Banerjee, S.2
Tung R., T.3
Oda, S.4
-
20
-
-
17044410869
-
-
J. H. Kim, J. Y. Jin, J. H. Jung, I. Lee, T. W. Kim, S. K. Lim, C. S. Yoon, and Y.-H. Kim, Appl. Phys. Lett. 86, 032904 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 032904
-
-
Kim J., H.1
Jin J., Y.2
Jung J., H.3
Lee, I.4
Kim T., W.5
Lim S., K.6
Yoon C., S.7
Kim, Y.-H.8
-
23
-
-
84872904899
-
-
Y.-H. Kim, G. F. Walker, J. Kim, and J. Park, J. Adhes. Sci. Technol. 1, 331 (1987).
-
(1987)
J. Adhes. Sci. Technol.
, vol.1
, pp. 331
-
-
Kim, Y.-H.1
Walker G., F.2
Kim, J.3
Park, J.4
-
24
-
-
0942289274
-
-
Y. Chung, H. P. Park, H. J. Jeon, C. S. Yoon, S. K. Kim, and Y.-H. Kim, J. Vac. Sci. Technol. B 21, L9 (2003).
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 9
-
-
Chung, Y.1
Park H., P.2
Jeon H., J.3
Yoon C., S.4
Kim S., K.5
Kim, Y.-H.6
-
26
-
-
34248540886
-
-
A dominant PL peak is sometimes observed for the recently prepared PI layer without Cu2 O particles in the spectral range from 2.0 to 2.5 eV.
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A dominant PL peak is sometimes observed for the recently prepared PI layer without Cu2 O particles in the spectral range from 2.0 to 2.5 eV.
-
-
-
-
29
-
-
0000923816
-
-
Academic, New York
-
See, for example, E. W. Williams and H. B. Bebb, Semiconductors and Semimetals, edited by R. K. Willardson and A. C. Beer (Academic, New York, 1992), Vol. 8, p. 321.
-
(1992)
Semiconductors and Semimetals
, vol.8
, pp. 321
-
-
Williams E., W.1
Bebb H., B.2
Willardson R., K.3
Beer A., C.4
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